Abstract
The rear side of an n type ( 1 0 0) Si wafer polished on one side was chosen as a substrate for CdTe thin film electrodeposition because its high density of surface non-uniformities is expected to result in a macroscopic equalization of injection conditions for electrons along the surface and subsequent uniform deposit growth. The films were grown from a plating bath containing 5 mM TeO2, 0.5 M CdSO4, 0.5 M H 2SO4 and 0.5 M NH4F at a temperature of 85 °C. The deposition potential was selected after studying the electrochemical behavior of the precursors by cyclic voltammetry. EDS analysis showed that films with near stoichiometric composition were obtained at ca. -0.575 V vs SCE. XRD showed that the as deposited films are well crystallized with a preferential orientation along the cubic direction, whereas AFM images show uniform and compact morphology. XPS results revealed that Te-O bonds, mainly in the surface, are also present.
Original language | English |
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Pages (from-to) | 113-122 |
Number of pages | 10 |
Journal | Journal of Electroanalytical Chemistry |
Volume | 574 |
Issue number | 1 |
DOIs | |
State | Published - 15 Dec 2004 |
Keywords
- CdTe
- Electrodeposition
- Si