Abstract
Electrochemical deposition of hematite (α- Fe2 O3) thin films was investigated on SnO2: F covered glass substrates. A new electrochemical method to obtain hematite thin films through a potential cycling procedure in an aqueous solution of Fe(III)+KF+ H2 O2 at room temperature is presented. The electrodeposited iron oxide thin films submitted to an annealing treatment showed a good quality and crystallinity. X-ray diffraction analysis confirmed the presence of the rhombohedrally centered hexagonal structure: α- Fe2 O3, hematite, as the sole crystalline phase. A bandgap energy of ca. 2.0 eV was measured for these films.
Original language | English |
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Pages (from-to) | C110-C113 |
Journal | Electrochemical and Solid-State Letters |
Volume | 9 |
Issue number | 7 |
DOIs | |
State | Published - Jul 2006 |