TY - JOUR
T1 - Electrochemical synthesis and photoelectrochemical characterization of copper hexacyanoferrate (II) deposited on n-Si(1 0 0)
AU - Cisternas, Regina
AU - Córdova, Ricardo A.
AU - Henríquez, Rodrigo G.
AU - Schrebler, Ricardo S.
AU - Muñoz, Eduardo C.
N1 - Publisher Copyright:
© 2015 Elsevier B.V. All rights reserved.
PY - 2015/3/15
Y1 - 2015/3/15
N2 - In this study, we examined the synthesis and characterization of copper hexacyanoferrate (II) on an n-Si(1 0 0) substrate. The copper hexacyanoferrate (II) was formed in the following stages: (i) deposition of metallic copper on an n-Si(1 0 0) electrode using an electroless process and (ii) electrooxidation of the copper film in a solution containing Fe(CN)64- ions. In the first stage, a study using a potential step method was performed, and the corresponding nucleation and growth mechanisms were determined. A morphologic analysis of the deposits obtained at different potentials was performed using atomic force microscopy. The results were consistent with a 3D progressive nucleation with diffusion-controlled growth. Electrochemical characterization under illumination demonstrated a charge transfer process due to the photogenerated holes in the valence band of silicon. Afterwards, the diffusion coefficient of the potassium ions and rate constants of the electrochemical processes were determined. Finally, this research is designed to increase the understanding of this system for its possible use in an electrochemical storage device that can be loaded in situ via the photovoltaic action of the doped silicon.
AB - In this study, we examined the synthesis and characterization of copper hexacyanoferrate (II) on an n-Si(1 0 0) substrate. The copper hexacyanoferrate (II) was formed in the following stages: (i) deposition of metallic copper on an n-Si(1 0 0) electrode using an electroless process and (ii) electrooxidation of the copper film in a solution containing Fe(CN)64- ions. In the first stage, a study using a potential step method was performed, and the corresponding nucleation and growth mechanisms were determined. A morphologic analysis of the deposits obtained at different potentials was performed using atomic force microscopy. The results were consistent with a 3D progressive nucleation with diffusion-controlled growth. Electrochemical characterization under illumination demonstrated a charge transfer process due to the photogenerated holes in the valence band of silicon. Afterwards, the diffusion coefficient of the potassium ions and rate constants of the electrochemical processes were determined. Finally, this research is designed to increase the understanding of this system for its possible use in an electrochemical storage device that can be loaded in situ via the photovoltaic action of the doped silicon.
KW - Copper electroless deposition
KW - Copper hexacyanoferrate
KW - Nucleation and growth
KW - Silicon
UR - http://www.scopus.com/inward/record.url?scp=84922795228&partnerID=8YFLogxK
U2 - 10.1016/j.jelechem.2015.01.030
DO - 10.1016/j.jelechem.2015.01.030
M3 - Article
AN - SCOPUS:84922795228
SN - 1572-6657
VL - 741
SP - 120
EP - 126
JO - Journal of Electroanalytical Chemistry
JF - Journal of Electroanalytical Chemistry
ER -