Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

F. Vera; R. Schrebler; E. Muñoz; C. Suarez; P. Cury; H. Gómez; R. Córdova; R. E. Marotti; E. A. Dalchiele

doi:10.1016/j.tsf.2005.04.052

Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

F. Vera, R. Schrebler, E. Muñoz, C. Suarez, P. Cury, H. Gómez, R. Córdova, R. E. Marotti, E. A. Dalchiele

INSTITUTE OF CHEMISTRY

Research output: Contribution to journal › Conference article › peer-review

102 Scopus citations

Abstract

Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO-Eosin B and NiO-Erythrosin J/electrolyte (I₂/I^-) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%.

Original language	English
Pages (from-to)	182-188
Number of pages	7
Journal	Thin Solid Films
Volume	490
Issue number	2
DOIs	https://doi.org/10.1016/j.tsf.2005.04.052
State	Published - 1 Nov 2005
Event	IMRC 2004 - Duration: 22 Aug 2004 → 26 Aug 2004

Keywords

Dye sensitization
NiO
Photocurrent
Solar cell

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10.1016/j.tsf.2005.04.052

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@article{a14c821feee34c97891e95e8c892bdda,

title = "Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes",

abstract = "Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO-Eosin B and NiO-Erythrosin J/electrolyte (I2/I-) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%.",

keywords = "Dye sensitization, NiO, Photocurrent, Solar cell",

author = "F. Vera and R. Schrebler and E. Mu{\~n}oz and C. Suarez and P. Cury and H. G{\'o}mez and R. C{\'o}rdova and Marotti, {R. E.} and Dalchiele, {E. A.}",

note = "Funding Information: The authors are thankful to FONDECYT-Chile for financial support of this work (proyect No: 1040658) and are also grateful to DGI-Universidad Cat{\'o}lica de Valpara{\'i}so, Chile. E.A.D. and R.E.M. would like to thank CSIC—Universidad de la Rep{\'u}blica and PEDECIBA-F{\'i}sica (Uruguay) for financial support. C.S. and E.M. specially thank CONICYT for their Doctoral Scholarships. Special thanks to Sara Green for the revision of the manuscript.; IMRC 2004 ; Conference date: 22-08-2004 Through 26-08-2004",

year = "2005",

month = nov,

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doi = "10.1016/j.tsf.2005.04.052",

language = "English",

volume = "490",

pages = "182--188",

journal = "Thin Solid Films",

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TY - JOUR

T1 - Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

AU - Vera, F.

AU - Schrebler, R.

AU - Muñoz, E.

AU - Suarez, C.

AU - Cury, P.

AU - Gómez, H.

AU - Córdova, R.

AU - Marotti, R. E.

AU - Dalchiele, E. A.

N1 - Funding Information: The authors are thankful to FONDECYT-Chile for financial support of this work (proyect No: 1040658) and are also grateful to DGI-Universidad Católica de Valparaíso, Chile. E.A.D. and R.E.M. would like to thank CSIC—Universidad de la República and PEDECIBA-Física (Uruguay) for financial support. C.S. and E.M. specially thank CONICYT for their Doctoral Scholarships. Special thanks to Sara Green for the revision of the manuscript.

PY - 2005/11/1

Y1 - 2005/11/1

N2 - Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO-Eosin B and NiO-Erythrosin J/electrolyte (I2/I-) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%.

AB - Nickel oxide (NiO) thin films were prepared onto ITO/glass substrates by spin-coating, dipping and electrochemically. Studies of the morphological and structural properties of the films were done by atomic force microscopy (AFM). Photoelectrochemical and optical experiments were carried out in order to characterize the semiconductor properties of the nanostructured NiO thin films. The experiments were also done for Eosin B- and Erythrosin J-sensitized nanostructured NiO films, with the aim to visualize their potential application as photocatodes in tandem dye-sensitized solar cells (TDSSC). The NiO grown by dipping was the one presenting the best morphological properties. The photoelectrochemical results for all the bare NiO, NiO-Eosin B and NiO-Erythrosin J/electrolyte (I2/I-) systems showed a p-type behavior. An enhancement in the photocurrent has been observed for the systems sensitized with the dyes. For the NiO/Erythrosin J system the enhancement of the current under illumination in comparison to the dark current was about 200%.

KW - Dye sensitization

KW - NiO

KW - Photocurrent

KW - Solar cell

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U2 - 10.1016/j.tsf.2005.04.052

DO - 10.1016/j.tsf.2005.04.052

M3 - Conference article

AN - SCOPUS:24044548671

SN - 0040-6090

VL - 490

SP - 182

EP - 188

JO - Thin Solid Films

JF - Thin Solid Films

IS - 2

T2 - IMRC 2004

Y2 - 22 August 2004 through 26 August 2004

ER -

Preparation and characterization of Eosin B- and Erythrosin J-sensitized nanostructured NiO thin film photocathodes

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