Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy

R. Schrebler, P. Cury, C. Suárez, E. Muñoz, F. Vera, R. Córdova, H. Gómez, J. R. Ramos-Barrado, D. Leinen, E. A. Dalchiele

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Rhenium thin films were prepared by electrodeposition from an aqueous solution containing 0.1 M Na2SO4+H2SO 4, pH 2 in presence of y mM HReO4. As substrates polycrystalline gold (y=0.75 mM HReO4) and monocrystalline n-Si(100) (y=40 mM HReO4) were used. The electrochemical growth of rhenium was studied by cyclic voltammetry and electrochemical quartz microbalance on gold electrodes. The results found in the potential region before the hydrogen evolution reaction (her) showed that ReO3, ReO2 and Re2O3 with different hydration grades can be formed. In the potential region where the her is occurring, either on gold or n-Si(100) the electrodeposition of metallic rhenium takes place. On both substrates, rhenium films were formed by electrolysis at constant potential and X-ray photoelectron spectroscopy technique was used to characterise these deposits. It was concluded that the electrodeposited films were of metallic rhenium and only the uppermost atomic layer contained rhenium oxide species.

Original languageEnglish
Pages (from-to)50-59
Number of pages10
JournalThin Solid Films
Volume483
Issue number1-2
DOIs
StatePublished - 1 Jul 2005
Externally publishedYes

Keywords

  • Electrochemical quartz microbalance
  • Electrodeposition
  • Rhenium
  • X-ray photoelectron spectroscopy

Fingerprint

Dive into the research topics of 'Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy'. Together they form a unique fingerprint.

Cite this