Abstract
In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-β-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO 3-x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO3 phase.
Original language | English |
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Pages (from-to) | 201-206 |
Number of pages | 6 |
Journal | Polyhedron |
Volume | 30 |
Issue number | 1 |
DOIs | |
State | Published - 12 Jan 2011 |
Keywords
- Photochemical deposition
- Thin films
- Tungsten oxides