An electrochemical deposition route for obtaining α-Fe 2O3 thin films

Ricardo Schrebler, Karen Bello, Francisca Vera, Paula Cury, Eduardo Muñoz, Rodrigo Del Río, Humberto Gómez Meier, Ricardo Córdova, Enrique A. Dalchiele

Resultado de la investigación: Contribución a una revistaArtículorevisión exhaustiva

73 Citas (Scopus)

Resumen

Electrochemical deposition of hematite (α- Fe2 O3) thin films was investigated on SnO2: F covered glass substrates. A new electrochemical method to obtain hematite thin films through a potential cycling procedure in an aqueous solution of Fe(III)+KF+ H2 O2 at room temperature is presented. The electrodeposited iron oxide thin films submitted to an annealing treatment showed a good quality and crystallinity. X-ray diffraction analysis confirmed the presence of the rhombohedrally centered hexagonal structure: α- Fe2 O3, hematite, as the sole crystalline phase. A bandgap energy of ca. 2.0 eV was measured for these films.

Idioma originalInglés
Páginas (desde-hasta)C110-C113
PublicaciónElectrochemical and Solid-State Letters
Volumen9
N.º7
DOI
EstadoPublicada - jul. 2006
Publicado de forma externa

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