Electrodeposition of In₂O₃ thin films from a dimethylsulfoxide based electrolytic solution

Química

• Electrolytic Solution 100%
• Heat Treatment 62%
• Electrodeposition 62%
• Semiconductor Film 53%
• Donor 50%
• Surface Composition 40%
• Tin Oxide 39%
• Transmittance 37%
• Glass Substrate 36%
• Liquid Film 35%
• Polycrystalline Solid 33%
• Cubic Space Group 30%
• Atomic Force Microscopy 29%
• Semiconductor 28%
• Optical Property 27%
• X-Ray Photoelectron Spectroscopy 26%
• Conductivity 24%
• Scanning Electron Microscopy 22%
• Oxide 20%
• X-Ray Diffraction 18%

Ingeniería y ciencia de los materiales

• Electrodeposition 95%
• Thin films 70%
• Energy gap 56%
• Semiconductor materials 43%
• Heat treatment 43%
• Fluorine 34%
• Tin oxides 34%
• Indium 32%
• Atomic force microscopy 31%
• Oxide films 30%
• X ray photoelectron spectroscopy 30%
• Surface structure 29%
• X ray diffraction 24%
• Glass 19%
• Scanning electron microscopy 19%
• Substrates 17%

Física y astronomía

• electrodeposition 77%
• heat treatment 40%
• thin films 38%
• fluorine 24%
• tin oxides 23%
• indium 23%
• x rays 22%
• transmittance 20%
• photoelectron spectroscopy 20%
• plots 20%
• atomic force microscopy 18%
• cycles 16%
• conductivity 16%
• scanning electron microscopy 16%
• oxides 15%
• glass 14%
• diffraction 13%