Reduction mechanism of O2 in DMSO and metal oxide thin film formation: CdO case study

R. Henríquez, P. Grez, E. Muoz, E. A. Dalchiele, R. Marotti, H. Gómez

Resultado de la investigación: Contribución a una revistaArtículorevisión exhaustiva

4 Citas (Scopus)

Resumen

The electrochemical reduction of O2 in a dimethyl sulfoxide (DMSO) solution onto a glassy carbon substrate at 423 K has been studied. Electrochemical potentiodynamic studies show that the reduction process is controlled by O2 diffusion and reveal a two-step mechanism. The first one corresponds to an electrochemical step which gives the superoxide ion that, in a second chemical step, forms the peroxide ions through a disproportion reaction. The proposed mechanism can be used for the formation of semiconductor CdO thin films. Here, results for CdO film formation, obtained in a direct way without the presence of Cd (OH)2 mixtures, are presented.

Idioma originalInglés
Páginas (desde-hasta)H288-H291
PublicaciónElectrochemical and Solid-State Letters
Volumen12
N.º8
DOI
EstadoPublicada - 2009
Publicado de forma externa

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