Synthesis and evaluation of bis-β-diketonate dioxotungsten(VI) complexes as precursors for the photodeposition of WO3 films

G. E. Buono-Core; A. H. Klahn; C. Castillo; M. J. Bustamante; E. Muñoz; G. Cabello; B. Chornik

doi:10.1016/j.poly.2010.10.007

Synthesis and evaluation of bis-β-diketonate dioxotungsten(VI) complexes as precursors for the photodeposition of WO₃ films

G. E. Buono-Core, A. H. Klahn, C. Castillo, M. J. Bustamante, E. Muñoz, G. Cabello, B. Chornik

Resultado de la investigación: Contribución a una revista › Artículo › revisión exhaustiva

20 Citas (Scopus)

Resumen

In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-β-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO _3-x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO₃ phase.

Idioma original	Inglés
Páginas (desde-hasta)	201-206
Número de páginas	6
Publicación	Polyhedron
Volumen	30
N.º	1
DOI	https://doi.org/10.1016/j.poly.2010.10.007
Estado	Publicada - 12 ene. 2011
Publicado de forma externa	Sí

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title = "Synthesis and evaluation of bis-β-diketonate dioxotungsten(VI) complexes as precursors for the photodeposition of WO3 films",

abstract = "In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-β-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO 3-x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO3 phase.",

keywords = "Photochemical deposition, Thin films, Tungsten oxides",

author = "Buono-Core, {G. E.} and Klahn, {A. H.} and C. Castillo and Bustamante, {M. J.} and E. Mu{\~n}oz and G. Cabello and B. Chornik",

note = "Funding Information: This research was supported by FONDECYT, Chile (Project No. 1080225 ) and Pontificia Universidad Cat{\'o}lica de Valpara{\'i}so (Project D.I. No. 125.727/08 ).",

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TY - JOUR

T1 - Synthesis and evaluation of bis-β-diketonate dioxotungsten(VI) complexes as precursors for the photodeposition of WO3 films

AU - Buono-Core, G. E.

AU - Klahn, A. H.

AU - Castillo, C.

AU - Bustamante, M. J.

AU - Muñoz, E.

AU - Cabello, G.

AU - Chornik, B.

N1 - Funding Information: This research was supported by FONDECYT, Chile (Project No. 1080225 ) and Pontificia Universidad Católica de Valparaíso (Project D.I. No. 125.727/08 ).

PY - 2011/1/12

Y1 - 2011/1/12

N2 - In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-β-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO 3-x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO3 phase.

AB - In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-β-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO 3-x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO3 phase.

KW - Photochemical deposition

KW - Thin films

KW - Tungsten oxides

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M3 - Article

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VL - 30

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JO - Polyhedron

JF - Polyhedron

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